DTIC ADA496838: The Effect of Size Distribution pdf

DTIC ADA496838: The Effect of Size Distribution

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We use Ion Beam Proximity Lithography (IBPL) to produce 4mm x 4mm arrays of 220 nm dots in perpendicularly-oriented Co/Pd multilayered media. IBPL is used to reduce the size distribution sigmaD of the arrays, and subsequently He+ ion irradiation is used to reduce their anisotropy. The Switching Field Distribution sigma(Hcr)/H(Cr) is measured for each sample before and after irradiation, and a linear relationship is experimentally found between sigma(Hcr)/H(Cr) and sigmaD. We argue that the slope of the line is due to the self-demagnetization effect of individual dots (and therefore, it is not strictly a line) and that the intercept of the line is inversely proportional to the permeability of the nanostructured material

• Creator/s: Defense Technical Information Center
• Date: 8/1/2008
• Year: 2008
• Book Topics/Themes: DTIC Archive, Smith, Darren, HOUSTON UNIV TX CENTER FOR NANOMAGNETIC SYSTEMS, *NANOSTRUCTURES, *ARRAYS, ION BEAMS, ANISOTROPY, SWITCHING, PALLADIUM, COBALT, SIZES(DIMENSIONS), SYMPOSIA, LITHOGRAPHY

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